Chemical-Mechanical Planarization of Semiconductor Materials
Download or Read eBook Chemical-Mechanical Planarization of Semiconductor Materials PDF written by M.R. Oliver and published by Springer Science & Business Media. This book was released on 2004-01-26 with total page 444 pages. Available in PDF, EPUB and Kindle.
| Author | : M.R. Oliver |
| Publisher | : Springer Science & Business Media |
| Total Pages | : 444 |
| Release | : 2004-01-26 |
| ISBN-10 | : 3540431810 |
| ISBN-13 | : 9783540431817 |
| Rating | : 4/5 (10 Downloads) |
Book Synopsis Chemical-Mechanical Planarization of Semiconductor Materials by : M.R. Oliver
Book excerpt: This book contains a comprehensive review of CMP (Chemical-Mechanical Planarization) technology, one of the most exciting areas in the field of semiconductor technology. It contains detailed discussions of all aspects of the technology, for both dielectrics and metals. The state of polishing models and their relation to experimental results are covered. Polishing tools and consumables are also covered. The leading edge issues of damascene and new dielectrics as well as slurryless technology are discussed.
