Materials Issues for Tunable RF and Microwave Devices III: Volume 720

Download or Read eBook Materials Issues for Tunable RF and Microwave Devices III: Volume 720 PDF written by Steven C. Tidrow and published by . This book was released on 2002-08-09 with total page 232 pages. Available in PDF, EPUB and Kindle.
Materials Issues for Tunable RF and Microwave Devices III: Volume 720
Author :
Publisher :
Total Pages : 232
Release :
ISBN-10 : UCSD:31822032143943
ISBN-13 :
Rating : 4/5 (43 Downloads)

Book Synopsis Materials Issues for Tunable RF and Microwave Devices III: Volume 720 by : Steven C. Tidrow

Book excerpt: Challenges facing the implementation of an affordable tunable RF and microwave device technology are discussed in these papers from an April 2002 meeting. Materials issues and devices are examined, with information on new tunable materials, issues of preparation and optimization of bulk and think film properties, material and surface characterization, evaluation of material loss and loss mechanisms, and effects of microstructure. At the device level, phase shifters are discussed and a new device concept for variable true time delay versus phase shift is introduced. At the system level, a paraelectric lens is used to demonstrate electronic beam steering of an antenna. Tidrow is affiliated with the US Army Research Laboratory. Annotation copyrighted by Book News, Inc., Portland, OR


Materials Issues for Tunable RF and Microwave Devices III: Volume 720 Related Books

Materials Issues for Tunable RF and Microwave Devices III: Volume 720
Language: en
Pages: 232
Authors: Steven C. Tidrow
Categories: Technology & Engineering
Type: BOOK - Published: 2002-08-09 - Publisher:

DOWNLOAD EBOOK

Challenges facing the implementation of an affordable tunable RF and microwave device technology are discussed in these papers from an April 2002 meeting. Mater
Defect and Impurity Engineered Semiconductors and Devices III: Volume 719
Language: en
Pages: 522
Authors: S. Ashok
Categories: Technology & Engineering
Type: BOOK - Published: 2002-08-09 - Publisher:

DOWNLOAD EBOOK

This book focuses on the deliberate introduction and manipulation of defects and impurities in order to engineer desired properties in semiconductor materials a
Novel Materials and Processes for Advanced CMOS: Volume 745
Language: en
Pages: 408
Authors: Mark I. Gardner
Categories: Computers
Type: BOOK - Published: 2003-03-25 - Publisher:

DOWNLOAD EBOOK

Progress in MOS integrated-circuit technology is largely driven by the ability to dimensionally scale the constituent components of individual devices and their
Materials and Devices for Optoelectronics and Microphotonics
Language: en
Pages: 520
Authors: Ralf B. Wehrspohn
Categories: Technology & Engineering
Type: BOOK - Published: 2002 - Publisher:

DOWNLOAD EBOOK

This volume combines the proceedings of Symposium K, Materials and Devices for Optoelectronics and Photonics, and Symposium L, Photonic Crystals--From Materials
Defect and Impurity Engineered Semiconductors and Devices
Language: en
Pages: 520
Authors:
Categories: Semiconductors
Type: BOOK - Published: 2002 - Publisher:

DOWNLOAD EBOOK